Mist elimination efficiency of 99% for 10μm, 5μm, 3μm, and 2μm particles.
Effective treatment of etching line acid fumes and vapors containing hydrofluoric acid (HF), hydrochloric acid (HCl), sulfuric acid (H2SO4), nitric acid (HNO3), phosphoric acid (H3PO4), etc.
High efficiency and low maintenance costs, while also reducing chemical dosing and wastewater treatment volume in scrubbers, lowering operating costs.
Compliant with international ESG trends.
System Features
Used as a mist elimination layer in wet scrubbers.
Gas-liquid separator for vertical and horizontal electroplating etching lines, droplet capture in chemical processes, with mist elimination efficiency of 99% for 10μm, 5μm, 3μm, and 2μm particles.
