Plume / Mist Control (Acidic Mist / Organic Plume)

Advantages Introduction

  • Effective for HCl, H_2SO_4, HNO_3, Aqua Regia, and NH_4Cl mists / salts.
  • Treats small air volumes at the source (Local) to prevent Central Scrubber overload and reduce costs.
  • Eliminates visible stack plumes to improve corporate image and environmental compliance.
 
System Features
  • When exhaust gas flows through the mist eliminator, liquid droplets below 10μm are collected primarily through inertial impaction, direct interception, and Brownian motion, reducing fog formation.
  • Large amounts of acid mist are generated during wafer reclaim processes involving heated cleaning with sulfuric acid and hydrogen peroxide.
  • Treatment of fuming hydrochloric acid from hydrochloric acid tank truck dosing and hydrochloric acid preparation tanks.
  • Treatment of ammonium chloride salts generated during ammonia recovery and reuse processes. No chemical additives are required for adjusting inorganic acidic fumes.
Applicable Industries
  • Semiconductor, Wafer Reclamation industries. 
  • TFT-LCD, LED Diode. 
  • Acid Waste Liquid Recovery, PCB industries.
  • Hydrochloric Acid production.