Treatment efficiency for submicron dust particles of 0.1~1μm in waste gas (≧90%).
Treatment efficiency for silicon dioxide ≧1μm in exhaust gas (≧90%).
Effective treatment of POU waste gas containing SiH4, BCl3, and other compounds.
High removal efficiency for submicron particles, low maintenance time, and low operating costs.
System Features
A venturi tube is used to create high compression of gas / liquid, inducing nucleation and coagulation that causes submicron particles to grow to diameters greater than 1 micron. The enlarged particles are then captured by media packing material. Through repeated multi-stage particle growth and collection, high removal efficiency is achieved.
Particulate waste liquid is removed via an agitation system with overflow drainage, reducing maintenance requirements.
The high mass transfer design achieves high efficiency for acids/bases without requiring chemical dosing.
Applicable Industries
Semiconductors.
TFT-LCD, LED, and Silicon-based Solar Cell industries.
